摘要
光罩基板
产品介绍
●光罩基板
产品描述：适用于制作光掩模版的基体材料，依据客户需求，可选用各种材质如：合成石
英、B270i、苏打玻璃、超白玻璃以及客户指定的其它材料，通过精密加工
，达到具有高平坦、高平行、高光学透射、材料表面和内部没有缺陷等特性，广泛应用于
IC（集成电路）、FPD（平板显示器）、PCB（印刷电路板）、MEMS（微机电系统）等领域。
Product description: Photomask transparent substrate is the base material for making photomask.
The material can be synthetic quartz,schott B270i,soda lime, ultra clear glass or other optical glass according to customer needs.
The surface has high-quality properties such as high flatness, high parallel,high optical transmission，and no defects on the surface or inside of the material after precision finishing .Photomasks are widely used in IC(Integrated Circuit), FPD (Flat Panel Display),PCB (Printed Circuit Board),MEMS (Micro Electro Mechanical Systems) and other fields.
